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Shandong Zhongshan Photoelectric Materials Co., Ltd
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(Total 12 Products for Carbonyl Fluoride Chemicals Agent)
Carbonyl fluoride CAS: 353-50-4 COF2 99% Hight Purity For Water Etching Chemicals Agent
Carbonyl fluoride CAS: 353-50-4 COF2 99% Hight Purity For Water Etching Chemicals Agent
Carbonyl fluoride CAS: 353-50-4 COF2 Hight Purity Forr Etching Chemicals Agent
Carbonyl fluoride CAS: 353-50-4 COF2 Hight Purity For Etching Chemicals Agent
Carbonyl fluoride COF2 Hight Purity Forr Etching CAS: 353-50-4 Chemicals Agent
Carbonyl fluoride COF2 Hight Purity Forr Etching CAS: 353-50-4 Chemicals Agent
Chlorine Trifluoride CAS:7790-91-2 ClF3 High Purity 99.9% 3N Semiconductor Chemical gas
Chlorine Trifluoride CAS:7790-91-2 ClF3 High Purity 99.9% 3N Semiconductor Chemical gas Product introduction Chlorine trifluoride (ClF3) is a kind of corrosive, colorless, sweet-tasting gas with a molecular weight of 92.45, it turns green liquid when it is cooled, it is strong irritating and oxidizing even at low...
Nitrogen Trifluoride CAS: 7783-54-2 NF3 99.5%Plasma Etching Gas
Nitrogen Trifluoride CAS: 7783-54-2 NF3 99.5%Plasma Etching Gas
Sulfur Tetrafluoride CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate
Sulfur Tetrafluoride CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate
Carbon Tetrafluoride CAS: 75-73-0 CF4 99.999% Hight Purity Chemical Specialty Gases
Carbon Tetrafluoride CAS: 75-73-0 CF4 99.999% Hight Purity Chemical Specialty Gases
Trifluoroiodomethane CAS:2314-97-8 99.99% 4N CF3I High Purity for Semiconductors erching processing materials Product use:
Hexafluoroethane CAS: 76-16-4 C2F6 Hight Purity 99.999% 5N For Semiconductor etchant gas
Hexafluoroethane CAS: 76-16-4 C2F6 Hight Purity 99.999% 5N For Semiconductor etchant gas
Trifluoroiodomethane CAS : 2314-97-8 CF3I 99.99% Hight Purity For Water Etching Chemicals Agent
Trifluoroiodomethane CAS : 2314-97-8 CF3I 99.99% Hight Purity For Water Etching Chemicals Agent
C3F8 Octafluoropropane CAS: 76-19-7 99.999% High Purity Wafer Etching Materials
C3F8 Octafluoropropane CAS: 76-19-7 99.999% High Purity Wafer Etching Materials
Boron11 Semiconductor Dry Etching Semiconductor Dopant
Boron11 Semiconductor Dopant Semiconductor Dry Etching
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