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Shandong Zhongshan Photoelectric Materials Co., Ltd

Shandong Zhongshan Photoelectric Materials Co., Ltd

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Shandong Zhongshan Photoelectric Materials Co., Ltd

[Shandong,China]

Business Type:Manufacturer

Main Markets: Worldwide

Exporter:31% - 40%

Certs:ISO9001, CE, FCC, MSDS, RoHS

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About Us

Shandong Zhongshan Photoelectric Materials Co., Ltd.is a national-level high-tech enterprise integrating R&D, pilot testing and industrialization, with a total investment of 1.3 billion yuan. The company's lithium fluorocarbon battery project is listed as a major construction project in Shandong Province in 2020 , Innovatively developed high specific energy lithium carbon fluoride batteries and their key materials, and took the lead in realizing large-scale mass production of carbon fluoride cathode materials in China. The main products are lithium fluorinated carbon (BR) batteries, special functional fluorocarbon materials (fluorinated graphite, fluorinated graphene series materials);...

Categories and Products

Carbon Fluoride Series Materials

Special Functional Fluorocarbon Materials

Fluorographite CAS:11113-63-6 Battery Cathode Material Solid Lubricating MaterialsAnti-Corrosion and Anti-Fouling Paint

Fluorinated Graphene CAS: 51311-17-2 New Energy Nattery Materials Anti-Wear lubrication applications

Fluorinated Carbon Black CAS: 51311-17-2 Battery Material Lubricant Additive Materials

Fluorinated Carbon Fiber CAS: 51311-17-2 Fluorocarbon Industrial Materials Battery materialSolid lubrication

Fluorinated Carbon Nanotube FCNTs CAS: 51311-17-2 Lithium Battery Cathode Material

Fluorinated Activated Carbon CAS: 51311-17-2 Special Fluorocarbon Material Battery Cathode Material

Fluorinated Coke CAS: 51311-17-2 Oil-resistant and Waterproof Coating Battery Material

Fluoropitch CAS: 51311-17-2 Material For Waterproof Lubrication Battery Fields

Diamond Grinding Liquid LED Chip Processing Grinding and Polishing Solution

Fluorinated Fullerene C60F48 CAS:51311-17-2Chemical Powdered Solid Battery Cathode Material

Anticorrosive and Antifouling Paint/Coating Additives

Graphite Fluoride CAS:11113-63-6 Battery Cathode Material Anticorrosive and Antifouling Paint

Fluorinated Graphene CAS: 51311-17-2 Anti-corrosion and Anti-fouling Paint New Energy Nattery Materials

Fluoro pitch CAS: 51311-17-2 Material For Waterproof Lubrication Anti-corrosion and anti-fouling paint

CAS: 51311-17-2 Fluorinated Coke Waterproof Coating Battery Material

Fluorinated Carbon Black CAS: 51311-17-2 Battery Material Oil-resistant and Waterproof coating

Solid Lubrication Materials

Graphite Fluoride CAS:11113-63-6 Battery Cathode Material Solid Lubricating Material

Fluorinated Graphene CAS: 51311-17-2 Solid Lubricating Material New Energy Nattery Materials

Activated Carbon CAS: 51311-17-2 Special Fluorocarbon Material Solid Lubricating material

Fluorocarbon Black CAS: 51311-17-2 Battery Material Oil-resistant and Waterproof coating

Textile Fabric Waterproofing Agent

NF-300 Modified Resin Aqueous Solution

NF-300 Fluorine-free Waterproof Agent for Textile Material

Semiconductor Electronic Chemical Materials

Semiconductor/Wafer Etching Materials

Xenon Difluoride CAS: 13709-36-9 XeF2 99.999% 5N For Semiconductor Etching

Trifluoroiodomethane CAS : 2314-97-8 CF3I 99.99% Hight Purity For Water Etching Chemicals Agent

Carbon Tetrafluoride CAS: 75-73-0 CF4 99.999% Hight Purity Chemical Specialty Gases

Hydrogen Fluoride CAS: 7664-39-3 HF 99.999% Hight Purity For Wafer Etching Materials

C3F8 Octafluoropropane CAS: 76-19-7 99.999% High Purity Wafer Etching Materials

NF3 Nitrogen Trifluoride CAS: 7783-54-2 99.5% High Purity for Electronic erching Special Gas

C4F6 Perfluorobutadiene CAS:685-63-2 4N 99.99% High Purity For Semiconductor etching

C4F6 CAS:685-63-2 Perfluorobutadiene 99.99% 4N Semiconductor/Wafer Etching Materials

Sulfur Tetrafluoride CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate

Perfluoropropane CAS: 76-19-7 Semiconductor Etchant C3F8 High Purity 99.999% 5N Chip Etching Materials

IodotrifluoromethaneCAS2314-97-8 99.99% 4N CF3I High Purity for Semiconductors erching process materials

C4F6 CAS:685-63-2 Hexafluoro-1 3-Butadiene 99.99% 4N chip Etching agent

Hexafluorobutadiene-1 3 C4F6 CAS:685-63-2 99.99% 4N Semiconductor/Wafer Etching Materials

Perfluorobuta-1 3-Diene C4F6 CAS:685-63-299.99% 4N Semiconductor/Wafer Etching Materials

Hexafluorobutadiene C4F6 CAS:685-63-2 99.99% 4N Semiconductor Etching Materials

Schwefeltetrafluorid CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate

Boron-11 trifluoride CAS:7637-07-2 Semiconductor electronic grade

Germanium Tetrafluoride CAS:7783-58-6 high-purity 99.999%5N GeF4 Semiconductor process materials

Molybdenum hexafluoride MoF₆ 99.99% 4N CAS#: 7783-77-9

Boron-10 trifluoride CAS No 7637-07-2 BF3 Semiconductor electronic grade

Semiconductor/wafer Cleaning Agent

Carbonyl fluoride CAS: 353-50-4 COF2 Hight Purity Forr Etching Chemicals Agent

Semiconductor Electronic Chemical Materials

Oxygen Difluoride CAS: 7783-41-7 OF2 Purity 99.5%For the Oxidation and Fluorination reaction.

Tantalum Pentafluoride CAS: 7783-71-3 TaF5 99.9% 3N Chemical Crystal Material Semiconductor Process materials

Titanium Tetrafluoride CAS: 7783-63-3 TiF4 Purity 98.5% For Microelectronics industry application

MolybdenuM VI Fluoride MoF6 CAS:7783-77-9 99.99% 4N High Purity

Tantalum(V) Fluoride CAS: 7783-71-3 TaF5 99.9% 3N Chemical Crystal Material Semiconductor Process materials

Titanium(IV) Fluoride CAS: 7783-63-3 TiF4 Purity 98.5% For Microelectronics industry application

Fluorine-containing High-purity Electronic Special Gas

High Purity Fluorine gas F2 High Purity 99.99% 4N Chemical Cleaning Agent

Trifluoroiodomethane CAS:2314-97-8 99.99% 4N CF3I High Purity for Semiconductors erching process materials

Carbon Tetrafluoride CAS: 75-73-0 CF4 High Purity 99.999% 5N For Microelectronics Industry

Chlorine Trifluoride CAS:7790-91-2 ClF3 High Purity 99.9% 3N Semiconductor Chemical gas

Tungsten hexafluoride CAS: 7783-82-6 WF6 High Purity 99.9% 3N Semiconductor material

High purity Silicon Tetrafluoride CAS: 7783-61-1 SiF4 99.999% 5N Chemical Electronic Specialty Gases

Hexafluoroethane CAS: 76-16-4 C2F6 Hight Purity 99.999% 5N For Semiconductor etchant gas

Octafluoropropane CAS: 76-19-7 C3F8 High Purity 99.999% 5N For Semiconductor industry

Nitrogen Trifluoride CAS: 7783-54-2 NF3 99.5%Plasma Etching Gas

Perfluorobutadiene CAS:685-63-2 C4F6 99.99% 4N Hight Purity For Semiconductor

Carbonyl fluoride CAS: 353-50-4 COF2 99% Hight Purity For Water Etching Chemicals Agent

Sulfur Tetrafluoride CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate

Sulfur Hexafluoride CAS: 2551-62-4 SF6 99.999% 5N High-Purity Electronic Special Gas

High Purity Hydrogen CAS:135-77-3 H2 99.999 5N High-purity Electronic Special Gas

Tetrafluoromethane CAS: 75-73-0 CF4 High Purity 99.999% 5N For Microelectronics Industry

Tungsten(VI) Fluoride CAS: 7783-82-6 WF6 High Purity 99.999% 5N Semiconductor material

5N Sulphur Hexafluoride CAS: 2551-62-4 SF6 99.999% Electronic Special Gas

Fluorinated Organic Solvent

High Purity Hydrogen Fluoride CAS:7664-39-3 HF Purity:99.999% 5N Semiconductor organic solution

Wafer Cleaner

High Purity Fluorine gas F2 High Purity 99.99% 4N Chemical Cleaning Agent

Carbonyl fluoride COF2 Hight Purity Forr Etching CAS: 353-50-4 Chemicals Agent

Fluorine-containing Biomedical Materials

Fluorinated Medical Reagents

Perfluorotripropylamine CAS:338-83-0 C9F21N Pharmaceutical Materials

Perfluorohexadecane CAS: 355-49-7 C16F34 For Pharmaceutical Intermediates and Chemical Intermediates

Perfluorooctane CAS:307-34-6 C8F18 Cleaning Agents for Precision Machinery

Sodium Trifluoromethanesulfinate CAS: 2926-29-6 CF3NaO2S Pharmaceutical intermediates

PerfluorodecalinCAS:306-94-5 C10F18 Pharmaceutical intermediates Artificial blood

Perfluorooctyl bromide CAS: 423-55-2 C8BrF17 Medical application reagent

Perfluorotributylamine CAS: 311-89-7(N(C4F9)3 Used in Medicine PesticidesAerospace Electronics

Stable Isotope Materials

Nuclear Power Safety Materials

Boron-10 B-10 Stable Isotope Materials Nuclear Safety Materials

Boron11 Semiconductor Dry Etching Semiconductor Dopant

Boron Stable Isotope

Boron-10 B-10 Stable Isotope Materials Nuclear Safety Materials

Boron-11 High Temperature and Radiation Resistance Semiconductor Material Dopant

Diborane Electronic Specialty Gases Electronic Industry Dopant Semiconductor Materials

Boron tribromide 11 Semiconductor Industry Dopants Organic synthesis catalyst

Boron11 Trifluoride Semiconductor Dopant Semiconductor Dry Etching

Boron Trifluoride 11 BF3 99.999%5N Electronic Specialty Gase Optical Fiber Industry Raw Materials

Triethyl Borate11 Semiconductor Materials Wafer Dopants

New Energy Battery Materials

New Energy Battery Electrolyte and Its Additives

Lithium Silicon Alloy CAS: 68848-64-6 Lithium Thermal Battery Anode Material High Specific Energy

Thermal Battery Materials

0.1 0.2mm Ultra-Thin lithium LI CAS:7439-93-2 Battery Material High Energy Density Long Service life

Lithium tetrafluoroborate LiBF4 CAS:14283-07-9 Chemical Ggent Electrolyte and Additives

Lithium Hexafluorophosphate LiPF6 CAS: 21324-40-3 Electrolyte Additives Battery material

Lithium Boron Alloy Li7B6 Anode Material For lithium Thermal Battery

Lithium-fluorocarbon(Li-(CFx)n) Battery

Button Lithium-fluorocarbon Battery (Li-(CFx)n) models

Button Lithium-fluorocarbon Battery Li-CFxn models of BR2016

Button Lithium-fluorocarbon Battery Li-CFxn models of BR2025

Button Lithium-fluorocarbon Battery Li-CFxn models of BR2032

Button Lithium-fluorocarbon Battery Li-CFxn models of BR1220

Button Lithium-fluorocarbon Battery Li-CFxn models of BR1225

Button Lithium-fluorocarbon Battery Li-CFxn models of BR1616

Button Lithium-fluorocarbon Battery Li-CFxn models of BR1632

Button Lithium-fluorocarbon Battery Li-CFxn models of BR1620

Button Lithium-fluorocarbon Battery Li-CFxn models of BR2450

Lithium-fluorocarbon(Li-(CFx)n) Cylindrical Battery of 18650

Button Lithium-fluorocarbon cells models of BR1220 for TPMS

Lithium-fluorocarbon(Li-(CFx)n) Cylindrical Battery

Lithium-fluorocarbon(Li-(CFx)n) Cylindrical Battery of 14250

Lithium-fluorocarbon(Li-(CFx)n) Cylindrical Battery of 14500

Lithium-fluorocarbon(Li-(CFx)n) Soft Package Battery

Lithium-fluorocarbon(Li-(CFx)n) Soft Package Battery of BF703769

Lithium-fluorocarbon(Li-(CFx)n) Soft Package Battery of BF855585

Products Keywords

NF-300 rare gas linde gas New energy neoflon vt BR2016 Cell linde gas ab fluorine rda nylon taslon Wafer Cleaner linde cal gas boron isotopes linde xenon gas oy linde gas ab daikin chemical Water Repellent c6 fluoropolymer fluorine products boron 11 neutrons Hydrogen Fluoride linde electronics fluorine in drugs Fabric Waterproof fluorine minerals Coating Additives boron 10 electrons Chip Etching Agent spring sub-textile boron-10 electrons carbon monofluoride cd3n2 compound name linde gas australia linde semiconductor boron-10 mass number fluorinated organics carbon fluoride uses boron-10 atomic mass Wafer Cleaning Agent sc1 cleaning process Chemical Special Gas fluorine in the body Single Wafer Cleaner Boron Stable Isotope Electronic Chemicals Lithium Metal Battery daikin fluoropolymers Hydrogen Fluoride Gas CAS 7647-19-0 99.9%3N is fluorine poisonous Lithium Silicon Alloy daikin water repellent ic fabrication process Battery Anode Material Wafer Etching Material boron-11 atomic number Li-CFxn Battery System Wafer Cleaning Machine Wafer Etching Materials Semiconductor Materials Chip Chemical Materials 99.99% 4N CAS: 7783-77-9 carbon fluorine compound fluorine water repellent Li-CFxn Models of BR1220 Li-CFxn Models of BR1225 Lithium Titanate Battery Diamond Polishing Liquid Stable Isotope Materials Megasonic Wafer Cleaning Electronic Chemicals SF6 3V Li-cfx Button Battery Li-CFxn Models of BR2032 F2 High Purity 99.99% 4N boron-10 neutron capture Boron-11 Steel Additives Electronic Special Gas F2 Thermal Battery Materials wafer cleaning techniques TaF5 99.9% 3N High Purity chlorine uses in pharmacy electronic chemicals list Fluorinated Solvents List Isotope Materials Nuclear wafer wet cleaning process 11BF3 Semiconductor Dopant Li7B6 High Specific Energy wafer cleaning process pdf wafer cleaning process ppt PF3 CAS:7783-55-3 99.9% 3N Which is the Battery System C4F6 Phip Etching Materials Lithium Hexafluorophosphate carbon monofluoride formula Solid Lubrication Materials boron-10 number of neutrons Fluorinated Organic Solvent Phosphorus Pentafluoride PF5 Lithium Fluorocarbon Battery Lithium-fluorocarbon Battery ic manufacturing process pdf carbon fluorine bond formula Semiconductor Cleaning Agent Water and Oil Proof Material semiconductor chemicals list New Energy Battery Materials Fluorinated Medical Reagents C4F6 Wafer Etching Materials carbon-fluorine covalent bond B-10 Stable Isotope Materials CAS:307-34-6 C8F18 Lubricants Semiconductor Isotope Isotope C16F34 Chemical Intermediates Semiconductor Industry Dopants Nuclear Power Safety Materials Semiconductor Electronic Grade Organic Synthesis Catalyst GAS Fluoropitch Waterproof Coating CF3NaO2 Pesticide Intermediate silicon wafer cleaning process Semiconductor Process Material Electronic Erching Special Gas Boron-10 Trifluoride 99.99% 4N Tantalum Pentafluoride 99.9%3N physical properties of fluorine 11B Dopants for Chemical Agents Fluorographite Battery Material Electronic Chemicals SF4 99% 2N XeF2 99.9% Electronic Chemicals 99.999%5N GeF4 Electronic Grade Phosphorus Trifluoride 99.9% 3N Semiconductor Brominating Agent solvents used in semiconductors Boron-11 Semiconductor Materials carbon fluorine chemical formula Carbon Fluoride Series Materials Electronic Chemicals CF3I 99.99%Diborane Semiconductor Materials CAS: 51311-17-2 Battery Material carbon fluorine ionic or covalent Fluorocarbon Industrial Materials Phosphorus Pentafluoride 99.9% 3N Carbonyl Fluoride Chemicals Agent Graphene Graphite Carbon Fluoride Super Penetration Waterproof Agen Boron-10 Nuclear Safety Materials Graphite Fluoride Battery Material chemicals for electronics industry Diamond Grinding Abrasive Material Hexafluoro-1 3-Butadiene 99.99% 4N Electronic Chemicals Materials SF6 Biomedical Materials CAS:2926-29-6 Boron-11 High Radiation Resistance Diborane Electronic Industry Agent CAS: 68848-64-6 High Specific Power boron 10 protons neutrons electrons NF3 99.5% Semiconductor Etching Gas CAS:7790-91-2 ClF3 Combustion Agent Perfluorodecalin Cosmetic Materials CAS: 76-19-7 Chip Etching Materials Water and Oil Proof Material 28/128 Sulfur Hexafluoride Hight Purity 5N Anticorrosive And Antifouling Paint carbon monofluoride lewis structure 11 BF3 Chip Manufacturing Chemicals Button Lithium-fluorocarbon Battery silicon wafer manufacturing process Semiconductor Material Intermediate Pharmaceutical Intermediates C9F21N Sulphur Hexafluoride Hight Purity 5N C2F6 99.999% 5N Electronic Chemicals CAS:11113-63-6 For Solid Lubrication Nitrogen Trifluoride Cleaning Agent.Waterproof Coating and Oil-resistant Oil-resistant and Waterproof Coating boron 10 protons, neutrons electrons Lithium-fluorocarbon Battery Li-CFxn Tantalum Pentafluoride CAS:7783-71-3 Phosphorus Trifluoride CAS:7783-55-3 boron 11 protons, neutrons electrons High-purity Electronic Special Gas F2 Boron11 Electrochemical Specialty Gas semiconductor manufacturing equipment Boron-11 Trifluoride Electronic Grade CAS:685-63-2 4N Semiconductor Etching HF CAS:7664-39-3 Hight Purity 99.999%carbon fluoride dot and cross diagram Boron-10 Trifluoride CAS No 7637-07-2 CAS:135-77-3 H2 For Oxidation Process Germanium Tetrafluoride CAS:7783-58-6 High Temperature Lubricating Material CAS: 51311-17-2 For Solid Lubrication chemicals used in electronics industry Perfluorooctyl Bromide Perfluorocarbon Semiconductor Process Material SiF4 5N Triethyl Borate11 Chemical Water Agent CAS: 76-19-7 C3F8 Electronic Chemicals Electronic Chemicals Hydrogen Fluoride Lithium Silicon Alloy Low Polarization C4F6 Dry Etching Gas for Semiconductor ClF3 High Purity Electronic Special Gas Electronic Chemicals CAS: 7783-41-7 OF2 NF3 CAS: 7783-54-2 Electronic Chemicals Electronic Chemicals CAS: 353-50-4 COF2 Lithium Hexafluorophosphate Electrolyte LiPF6 CAS: 21324 40 3 Chemical Material Lithium Silicon Alloy Chemical Material Perfluorotributylamine Chemical Reagent semiconductor manufacturing process pdf Lithium Boron Alloy High Specific Power CAS: 51311-17-2 Battery Cathode Material CAS:7783-58-6 GeF4 Material Intermediate 99.99% 4N High Purity Perfluorobutadiene MolybdenuM VI Fluoride Strong Fluridizer Perfluorobutadiene 99.99% 4N High Purity Fluorine-Containing Biomedical Materials WF6 Raw Material of Optical Materials 5N Electronic Grade Molybdenum Hexafluoride F2 Semi-conductive Application Materials CAS: 7783-63-3 TiF4 Electronic Chemicals CAS: 7783-61-1 SiF4 Electronic Chemicals WF6 Raw Material of Optical Materials 3N C3F8 Special Gas for Electronic Chemistry Carbonyl Fluoride Semiconductor Materials semiconductor gases and chemicals limited LiPF6 High Solubility Conductivity Safety Special Functional Fluorocarbon Materials Sulfur Tetrafluoride Medical Intermediate Fluorinated Graphene Electronic Chemicals Hydrogen Fluoride Electronic Chemicals 5N Semiconductor Materials C4F6 CAS:685-63-2 Schwefeltetrafluorid Medical Intermediate semiconductor manufacturing process steps 99% High Purity Chemical Special Gas COF2 Hexafluorobutadiene 99.99% 4N High Purity Nuclear Protective Clothing Materia LB-10 High Purity Wafer Manufacturing Materials Tetrafluoromethane Electronic Etching Gas COF2 99% High Purity Chemical Special Gas Semiconductor Materials Carbonyl Fluoride Perfluorotripropylamine Insulating Liquids Electronic Chemicals Perfluorobutadiene 4N H2 Hydrogen Semiconductor Process Material CF4 99.999% Semiconductor Process Material B11 Trichloride Organic Synthesis Catalyst Semiconductor Process Material CAS:76-19-7 Fluorinated Fullerene Electrical Insulator CAS: 51311-17-2 Solid Lubricating Material C3F8 99.999% 5N Semiconductor Chemical Gas Fluorinated Carbon Nanotube Powdered Solid C4F6 Semiconductor/Wafer Etching Materials SF4 CAS:7783-60-0 99%2N For Plasma Etching Other Name Methanesulfinic Acid Sodium Salt Semiconductor Electronic Chemical Materials CAS: 51311-17-2 High Temperature Resistance Fluorinated Fullerene C60F48 Carbon Isotope Diborane Electronic High Energy Fuel Dopant CAS: 2551-62-4 New UHV Dielectric Materials High Purity 99.999% 5N Electronic Chemicals Nitrogen TrifluoridePurity Purity 99.5% NF3 CAS: 75-73-0 CF4 Plasma Etching Gasmaterial Waterproof Anti-Corrosion Coating Materials Electronic Chemicals Octafluoropropane C3F8 Carbon Tetrafluoride Electronic Etching Gas Perfluorooctyl Bromide Chemical Water Agent CAS:685-63-2 4N Semiconductor Material C4F6 Perfluorooctane Pharmaceutical Intermediates Semiconductor Etching Gas CAS: 353-50-4 COF2 CAS: 353-50-4 COF2 Semiconductor Etching Gas CAS:338-83-0 C9F21N Precision Cleaning Agent 11B Electronic Chemicals for Chemical Agents Lithium Tetrafluoroborate Chemical Additives Perfluorooctane CAS:307-34-6 Cleaning Agents Xenon Difluoride CAS: 13709-36-9 High Purity Fluorinated Electronic Special Gas Chemicals Perfluorobutadiene Semiconductor Etching Gas Trifluoroiodomethane Etching Chemicals Agent Graphite Fluoride Solid Lubricating Material Electronic Chemicals Sulfur Tetrafluoride 2N Perfluorodecalin CAS:306-94-5 Chemical Agent Germanium Tetrafluoride Electronic Chemicals CF4 99.999%For Water Etching Chemicals Agent WF6raw Material of Chemical Vapor Deposition Electronic Chemicals Oxygen Difluoride 99.5%Iodotrifluoromethane Electronic Chemicals 4N CAS: 7664-39-3 Semiconductor Process Material WF6 CAS: 7783-82-6 Electronic Characteristics CAS: 355-49-7 C16F34 Chemical Liquid Material Fluorinated Carbon Fiber Corrosion Resistance CAS: 76-16-4 C2F6 ElectronicForcleaning Agent HF99.999% Chemical Electronic Specialty Gases WF6 Raw Material of Chemical Vapor Deposition Electronic Chemicals Carbon Tetrafluoride CF4 CF4 Hight Purity 99.999% Electronic Chemicals Triethyl Borate11 For PN Junction Manufacture NF-300 Waterproof Agent Three Prevention Type CAS: 51311-17-2 Special Fluorocarbon Material C60F48 CAS:51311-17-2 Biomedical Applications H2 Hputy Purity99.999 5N Electronic Chemicals XeF2 Semiconductor Process Material 5N 99.999%Semiconductor Process Material CAS : 2314-97-8 SF6 CAS: 2551-62-4 New UHV Dielectric Material Fluorinated Coke Chemical Processing Materials 0.1 0.2mm Ultra-Thin Lithium Belt Small Volume C3F8 99.999% for Water Etching Chemicals Agent Wafter Erching Process MaterialsCAS: 7783-54-2 CAS: 7783-71-3 TaF5 99.9% Electronic Chemicals Oxygen Difluoride 99.5%Semiconductor Materials Fluorinated Biomedical Intermediates Materials MoF6 CAS:7783-77-9 99.99% Electronic Chemicals CF3I 99.99% for Wafter Etching Chemicals Agent Electronic Chemicals Trifluoromethyl Iodide 4N Titanium Iv Fluoride Chemical Crystal Material Semiconductor Process Material CAS:7664-39-3 5N Lithium Tetrafluoroborate Electrolyte Additives CAS:685-63-2 4N Semiconductor Process Materials High Purity Iodotrifluoromethane Etching Gas 4N SiF4 High Purity 99.999% Semiconductor Material LiBF4 CAS:14283-07-9 Chemical Ggent Electrolyte Triethyl Borate11 Semiconductor Organic Solvent FCNTs Special Functional Fluorocarbon Materials Molybdenum Hexafluoride Molybdenum Hexafluoride Semiconductors Silicon and IC Process Chemicals 51311-17-2 High Temperature Lubricating Material SF4 CAS: 7783-60-0 99%Organic Fluorinating Agent Boron-11 Trifluoride Electron Characteristic Gas New Energy Battery Electrolyte And Its Additives Perfluorohexadecane Pharmaceutical Intermediates Fluoropitch CAS: 51311-17-2 Lubricating Material Hexafluoroethane Semiconductor Etching Materials Titanium Tetrafluoride Chemical Crystal Material Chemical Crystal Material Tantalum Pentafluoride 0.1 0.2mm Ultra-Thin LI Thermal Battery Material Semiconductor Wafter Process Etching Clean Agent Lithium Carbon Fluoride Battery Cathode Material Fluorine-Containing Pharmaceutical Intermediates Octafluoropropane Medicine Chemical Intermediates Semiconductor Process Material CAS: 7783-60-0 SF4 Stable Isotopes Boron-10 Boron-11 Trifluoride BF3 Parameters of Lithium-fluorocarbon Button Battery Chlorine Trifluoride Semiconductor Cleaning Agent Semiconductor Process Material MoF6 CAS:7783-77-9 handbook of silicon wafer cleaning technology pdf Fluorinated Graphene New Energy Battery Materials Boron11 Trichloride Electrochemical Specialty Gas Semiconductors Process Materials CAS No. 2314-97-8 Solid Lubrication Fluorinated Coke CAS: 51311-17-2 Semiconductor Process Material CAS: 7783-63-3 TiF4 CAS: 423-55-2 C8BrF17 Pharmaceutical Intermediates Fluoropitch CAS:51311-17-2Battery Cathode Material Electronic Industry Dopant Semiconductor Materials Perfluorotributylamine Pharmaceutical Intermediates C4F6 High Purity 99.99% 4N Chemical Specialty Gases Fluorinated Activated Carbon Battery Cathode Materia Semiconductor Process Material COF2 99% Hight Purity Lithium Boron Alloy Cell Negative Electrode Material Fluorinated Activated Carbon Battery Cathode Material 0.1 0.2mm Ultra-Thin Lithium Thermal Battery Material Fluorine-Containing High-Purity Electronic Special Gas CAS:306-94-5 C10F18 Artificial Blood Production Materials Make Low Resistance High Melting Point Circuit Interconnect Fluorine-free waterproofing agent for nylon four-way elastic Raw Materials for Preparing Optical Fiber Prefabricated Parts Used for Doping and Ion Implantation in the Semiconductor Industry

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