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(Total 12 Products for Sf4 Cas 7783 60 0 99 2n For Plasma Etching)
Sulfur Tetrafluoride CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate
Sulfur Tetrafluoride CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate
Sulfur Tetrafluoride CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate
Sulfur Tetrafluoride CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate
Schwefeltetrafluorid CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate
Schwefeltetrafluorid CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate
Trifluoroiodomethane CAS:2314-97-8 99.99% 4N CF3I High Purity for Semiconductors erching processing materials Product use:
Carbon Tetrafluoride CAS: 75-73-0 CF4 High Purity 99.999% 5N For Microelectronics Industry
Carbon Tetrafluoride CAS: 75-73-0 CF4 High Purity 99.999% 5N For Microelectronics Industry Product introduction Carbon tetrafluoride (CF4) is a colorless, odorless flammable with relative molecular mass of 88, melting point of 183.6℃, boiling point of 127.8℃. At room temperature, CF4 is a compressible gas with high...
Hexafluoroethane CAS: 76-16-4 C2F6 Hight Purity 99.999% 5N For Semiconductor etchant gas
Hexafluoroethane CAS: 76-16-4 C2F6 Hight Purity 99.999% 5N For Semiconductor etchant gas
Nitrogen Trifluoride CAS: 7783-54-2 NF3 99.5%Plasma Etching Gas
Nitrogen Trifluoride CAS: 7783-54-2 NF3 99.5%Plasma Etching Gas
Perfluorobutadiene CAS:685-63-2 C4F6 99.99% 4N Hight Purity For Semiconductor
Perfluorobutadiene CAS:685-63-2 C4F6 99.99% 4N Hight Purity For Semiconductor
Carbonyl fluoride CAS: 353-50-4 COF2 99% Hight Purity For Water Etching Chemicals Agent
Carbonyl fluoride CAS: 353-50-4 COF2 99% Hight Purity For Water Etching Chemicals Agent
Xenon Difluoride CAS: 13709-36-9 XeF2 99.999% 5N For Semiconductor Etching
Trifluoroiodomethane CAS : 2314-97-8 CF3I 99.99% Hight Purity For Water Etching Chemicals Agent
Trifluoroiodomethane CAS : 2314-97-8 CF3I 99.99% Hight Purity For Water Etching Chemicals Agent
Hydrogen Fluoride CAS: 7664-39-3 HF 99.999% Hight Purity For Wafer Etching Materials
Hydrogen Fluoride CAS: 7664-39-3 HF 99.999% Hight Purity ForWafer Etching Materials
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Privacy statement: Your privacy is very important to Us. Our company promises not to disclose your personal information to any external company with out your explicit permission.