Shandong Zhongshan Photoelectric Materials Co., Ltd
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(Total 12 Products for Semiconductor Process Material)
High purity Silicon Tetrafluoride CAS: 7783-61-1 SiF4 99.999% 5N Chemical Electronic Specialty Gases
High purity Silicon Tetrafluoride CAS: 7783-61-1 SiF4 99.999% 5N Chemical Electronic Specialty Gases Product introduction Silicon tetrafluoride (SiF4) is a kind of colorless, toxic, pungent and smelly gas with a molecular weight of 104.06. Silicon tetrafluoride is easily deliquescent and can produce thick smoke in...
Perfluorobutadiene CAS:685-63-2 C4F6 99.99% 4N Hight Purity For Semiconductor
Perfluorobutadiene CAS:685-63-2 C4F6 99.99% 4N Hight Purity For Semiconductor
Carbonyl fluoride CAS: 353-50-4 COF2 99% Hight Purity For Water Etching Chemicals Agent
Carbonyl fluoride CAS: 353-50-4 COF2 99% Hight Purity For Water Etching Chemicals Agent
Sulfur Tetrafluoride CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate
Sulfur Tetrafluoride CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate
High Purity Hydrogen CAS:135-77-3 H2 99.999 5N High-purity Electronic Special Gas
High Purity Hydrogen CAS:135-77-3 H2 99.999% 5N High-purity Electronic Special Gas
High Purity Hydrogen Fluoride CAS:7664-39-3 HF Purity:99.999% 5N Semiconductor organic solution
High purity Hydrogen Fluoride CAS:7664-39-3 HF Purity:99.999% 5N Semiconductor
Xenon Difluoride CAS: 13709-36-9 XeF2 99.999% 5N For Semiconductor Etching
Trifluoroiodomethane CAS : 2314-97-8 CF3I 99.99% Hight Purity For Water Etching Chemicals Agent
Trifluoroiodomethane CAS : 2314-97-8 CF3I 99.99% Hight Purity For Water Etching Chemicals Agent
Carbon Tetrafluoride CAS: 75-73-0 CF4 99.999% Hight Purity Chemical Specialty Gases
Carbon Tetrafluoride CAS: 75-73-0 CF4 99.999% Hight Purity Chemical Specialty Gases
Hydrogen Fluoride CAS: 7664-39-3 HF 99.999% Hight Purity For Wafer Etching Materials
Hydrogen Fluoride CAS: 7664-39-3 HF 99.999% Hight Purity ForWafer Etching Materials
C3F8 Octafluoropropane CAS: 76-19-7 99.999% High Purity Wafer Etching Materials
C3F8 Octafluoropropane CAS: 76-19-7 99.999% High Purity Wafer Etching Materials
Tantalum Pentafluoride CAS: 7783-71-3 TaF5 99.9% 3N Chemical Crystal Material Semiconductor Process materials
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