Shandong Zhongshan Photoelectric Materials Co., Ltd
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(Total 12 Products for Carbonyl Fluoride Semiconductor Materials)
Carbonyl fluoride CAS: 353-50-4 COF2 Hight Purity Forr Etching Chemicals Agent
Carbonyl fluoride CAS: 353-50-4 COF2 Hight Purity For Etching Chemicals Agent
Carbonyl fluoride COF2 Hight Purity Forr Etching CAS: 353-50-4 Chemicals Agent
Carbonyl fluoride COF2 Hight Purity Forr Etching CAS: 353-50-4 Chemicals Agent
Oxygen Difluoride CAS: 7783-41-7 OF2 Purity 99.5%For the Oxidation and Fluorination reaction.
Oxygen Difluoride CAS: 7783-41-7 OF2 Purity99.5%
Hydrogen Fluoride CAS: 7664-39-3 HF 99.999% Hight Purity For Wafer Etching Materials
Hydrogen Fluoride CAS: 7664-39-3 HF 99.999% Hight Purity ForWafer Etching Materials
NF3 Nitrogen Trifluoride CAS: 7783-54-2 99.5% High Purity for Electronic erching Special Gas
NF3 Nitrogen Trifluoride CAS: 7783-54-2 99.5%
Tantalum Pentafluoride CAS: 7783-71-3 TaF5 99.9% 3N Chemical Crystal Material Semiconductor Process materials
Boron Trifluoride 11 BF3 99.999%5N Electronic Specialty Gase Optical Fiber Industry Raw Materials
Boron Trifluoride 11 BF3 99.999%5N Electronic Specialty Gase Optical Fiber Industry Raw Materials
5N Sulphur Hexafluoride CAS: 2551-62-4 SF6 99.999% Electronic Special Gas
Sulphur Hexafluoride CAS: 2551-62-4 SF6 99.999% 5N High-Purity Electronic Special Gas
Tantalum(V) Fluoride CAS: 7783-71-3 TaF5 99.9% 3N Chemical Crystal Material Semiconductor Process materials
Graphite Fluoride CAS:11113-63-6 Battery Cathode Material Anticorrosive and Antifouling Paint
Graphite Fluoride CAS:11113-63-6 Battery Cathode Material Anticorrosive and Antifouling Paint Produ
Boron-11 trifluoride CAS:7637-07-2 Semiconductor electronic grade
Boron-11 trifluoride CAS:7637-07-2 BF₃ purity 99.99%4N Abundance of 11B 99.7% Product introduction The area of absorption cross section of
Germanium Tetrafluoride CAS:7783-58-6 high-purity 99.999%5N GeF4 Semiconductor process materials
Germanium Tetrafluoride CAS:7783-58-6 99.999%5N GeF4 Semiconductor process materials Product Usage Germanium tetrafluoride is used for doping and ion implantation in the semiconductor industry. Germanium tetrafluoride combined with disilane gas may directly fabricate silica-germanium microcrystals on glass substrate....
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