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Shandong Zhongshan Photoelectric Materials Co., Ltd
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(Total 12 Products for Fluorinated Graphene Electronic Chemicals)
Fluorinated Graphene CAS: 51311-17-2 New Energy Nattery Materials Anti-Wear lubrication applications
Fluorinated Graphene CAS: 51311-17-2 New Energy Nattery Materials Anti-Wear lubrication applications
Fluorinated Graphene CAS: 51311-17-2 Anti-corrosion and Anti-fouling Paint New Energy Nattery Materials
Fluorinated Graphene CAS: 51311-17-2 Solid Lubricating Material New Energy Nattery Materials
Fluorinated Graphene CAS: 51311-17-2 Solid Lubricating Material New Energy Nattery Materials
Trifluoroiodomethane CAS:2314-97-8 99.99% 4N CF3I High Purity for Semiconductors erching processing materials Product use:
Carbon Tetrafluoride CAS: 75-73-0 CF4 High Purity 99.999% 5N For Microelectronics Industry
Carbon Tetrafluoride CAS: 75-73-0 CF4 High Purity 99.999% 5N For Microelectronics Industry Product introduction Carbon tetrafluoride (CF4) is a colorless, odorless flammable with relative molecular mass of 88, melting point of 183.6℃, boiling point of 127.8℃. At room temperature, CF4 is a compressible gas with high...
High purity Silicon Tetrafluoride CAS: 7783-61-1 SiF4 99.999% 5N Chemical Electronic Specialty Gases
High purity Silicon Tetrafluoride CAS: 7783-61-1 SiF4 99.999% 5N Chemical Electronic Specialty Gases Product introduction Silicon tetrafluoride (SiF4) is a kind of colorless, toxic, pungent and smelly gas with a molecular weight of 104.06. Silicon tetrafluoride is easily deliquescent and can produce thick smoke in...
Hexafluoroethane CAS: 76-16-4 C2F6 Hight Purity 99.999% 5N For Semiconductor etchant gas
Hexafluoroethane CAS: 76-16-4 C2F6 Hight Purity 99.999% 5N For Semiconductor etchant gas
Octafluoropropane CAS: 76-19-7 C3F8 High Purity 99.999% 5N For Semiconductor industry
Octafluoropropane CAS: 76-19-7 C3F8 High Purity 99.999% 5N For Semiconductor Industry
Nitrogen Trifluoride CAS: 7783-54-2 NF3 99.5%Plasma Etching Gas
Nitrogen Trifluoride CAS: 7783-54-2 NF3 99.5%Plasma Etching Gas
Carbonyl fluoride CAS: 353-50-4 COF2 99% Hight Purity For Water Etching Chemicals Agent
Carbonyl fluoride CAS: 353-50-4 COF2 99% Hight Purity For Water Etching Chemicals Agent
Sulfur Tetrafluoride CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate
Sulfur Tetrafluoride CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate
Sulfur Hexafluoride CAS: 2551-62-4 SF6 99.999% 5N High-Purity Electronic Special Gas
Sulfur Hexafluoride CAS: 2551-62-4 SF6 99.999% 5N High-Purity Electronic Special Gas
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