Shandong Zhongshan Photoelectric Materials Co., Ltd
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(Total 6 Products for Used For Doping And Ion Implantation In The Semiconductor Industry)
Germanium Tetrafluoride CAS:7783-58-6 high-purity 99.999%5N GeF4 Semiconductor process materials
Germanium Tetrafluoride CAS:7783-58-6 99.999%5N GeF4 Semiconductor process materials Product Usage Germanium tetrafluoride is used for doping and ion implantation in the semiconductor industry. Germanium tetrafluoride combined with disilane gas may directly fabricate silica-germanium microcrystals on glass substrate....
Titanium Tetrafluoride CAS: 7783-63-3 TiF4 Purity 98.5% For Microelectronics industry application
Titanium Tetrafluoride CAS: 7783-63-3 TiF4 Purity 98.5% For Microelectronics industry application
Titanium(IV) Fluoride CAS: 7783-63-3 TiF4 Purity 98.5% For Microelectronics industry application
Titanium(IV) Fluoride CAS: 7783-63-3 TiF4 Purity 98.5% For Microelectronics industry application
Octafluoropropane CAS: 76-19-7 C3F8 High Purity 99.999% 5N For Semiconductor industry
Octafluoropropane CAS: 76-19-7 C3F8 High Purity 99.999% 5N For Semiconductor Industry
Diborane Electronic Specialty Gases Electronic Industry Dopant Semiconductor Materials
Diborane Electronic Specialty Gases Electronic Industry Dopant Semiconductor Materials
Boron tribromide 11 Semiconductor Industry Dopants Organic synthesis catalyst
Boron tribromide 11 Semiconductor Industry Dopants Organic synthesis catalyst
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