Shandong Zhongshan Photoelectric Materials Co., Ltd
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(Total 12 Products for Trifluoroiodomethane Etching Chemicals Agent)
Trifluoroiodomethane CAS : 2314-97-8 CF3I 99.99% Hight Purity For Water Etching Chemicals Agent
Trifluoroiodomethane CAS : 2314-97-8 CF3I 99.99% Hight Purity For Water Etching Chemicals Agent
Trifluoroiodomethane CAS：2314-97-8 99.99% 4N CF3I High Purity for Semiconductors erching processing materials Product use:
Hexafluoroethane CAS: 76-16-4 C2F6 Hight Purity 99.999% 5N For Semiconductor etchant gas
Hexafluoroethane CAS: 76-16-4 C2F6 Hight Purity 99.999% 5N For Semiconductor etchant gas
Nitrogen Trifluoride CAS: 7783-54-2 NF3 99.5%Plasma Etching Gas
Nitrogen Trifluoride CAS: 7783-54-2 NF3 99.5%Plasma Etching Gas
Carbonyl fluoride CAS: 353-50-4 COF2 99% Hight Purity For Water Etching Chemicals Agent
Carbonyl fluoride CAS: 353-50-4 COF2 99% Hight Purity For Water Etching Chemicals Agent
Carbon Tetrafluoride CAS: 75-73-0 CF4 99.999% Hight Purity Chemical Specialty Gases
Carbon Tetrafluoride CAS: 75-73-0 CF4 99.999% Hight Purity Chemical Specialty Gases
C3F8 Octafluoropropane CAS: 76-19-7 99.999% High Purity Wafer Etching Materials
C3F8 Octafluoropropane CAS: 76-19-7 99.999% High Purity Wafer Etching Materials
Carbonyl fluoride CAS: 353-50-4 COF2 Hight Purity Forr Etching Chemicals Agent
Carbonyl fluoride CAS: 353-50-4 COF2 Hight Purity For Etching Chemicals Agent
C4F6 CAS:685-63-2 Hexafluoro-1 3-Butadiene 99.99% 4N chip Etching agent
C4F6 CAS:685-63-2 Hexafluoro-1 3-Butadiene 99.99% 4N chip Etching agent
Carbonyl fluoride COF2 Hight Purity Forr Etching CAS: 353-50-4 Chemicals Agent
Carbonyl fluoride COF2 Hight Purity Forr Etching CAS: 353-50-4 Chemicals Agent
Sulfur Tetrafluoride CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate
Sulfur Tetrafluoride CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate
Boron11 Semiconductor Dry Etching Semiconductor Dopant
Boron11 Semiconductor Dopant Semiconductor Dry Etching
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