Shandong Zhongshan Photoelectric Materials Co., Ltd
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(Total 12 Products for F2 High Purity 99 99 4n)
High Purity Fluorine gas F2 High Purity 99.99% 4N Chemical Cleaning Agent
High Purity Fluorine gas F2 High Purity 99.99% 4N Chemical Cleaning Agent Product introduction Fluorine (F2) is a kind of strong oxidizing light yellow poisonous gas with pungent smell, relative molecular mass of 38.00, the boiling point of -188 ℃, which is soluble
High Purity Fluorine gas F2 High Purity 99.99% 4N Chemical Cleaning Agent
High Purity Fluorine gas F2 High Purity 99.99% 4N Chemical Cleaning Agent Product introduction Fluorine (F2) is a kind of strong oxidizing light yellow poisonous gas with pungent smell, relative molecular mass of 38.00, the boiling point of -188 ℃, which is soluble
Trifluoroiodomethane CAS：2314-97-8 99.99% 4N CF3I High Purity for Semiconductors erching processing materials Product use:
Perfluorobutadiene CAS:685-63-2 C4F6 99.99% 4N Hight Purity For Semiconductor
Perfluorobutadiene CAS:685-63-2 C4F6 99.99% 4N Hight Purity For Semiconductor
C4F6 Perfluorobutadiene CAS:685-63-2 4N 99.99% High Purity For Semiconductor etching
C4F6 Perfluorobutadiene CAS:685-63-2 4N 99.99% High Purity For Semiconductor etching
C4F6 CAS:685-63-2 Perfluorobutadiene 99.99% 4N Semiconductor/Wafer Etching Materials
C4F6 CAS:685-63-2 Perfluorobutadiene 99.99% 4N Semiconductor/Wafer Etching Materials
IodotrifluoromethaneCAS2314-97-8 99.99% 4N CF3I High Purity for Semiconductors erching process materials
Hexafluorobutadiene-1 3 C4F6 CAS:685-63-2 99.99% 4N Semiconductor/Wafer Etching Materials
Hexafluorobutadiene-1 3 C4F6 CAS:685-63-2 99.99% 4N Semiconductor/Wafer Etching Materials
Perfluorobuta-1 3-Diene C4F6 CAS:685-63-299.99% 4N Semiconductor/Wafer Etching Materials
Perfluorobuta-1 3-Diene C4F6 CAS:685-63-2 99.99% 4N Semiconductor/Wafer Etching Materials
Hexafluorobutadiene C4F6 CAS:685-63-2 99.99% 4N Semiconductor Etching Materials
Hexafluorobutadiene C4F6 CAS:685-63-2 99.99% 4N Semiconductor/Wafer Etching Materials
MolybdenuM VI Fluoride MoF6 CAS:7783-77-9 99.99% 4N High Purity
MolybdenuM(VI) Fluoride MoF6 CAS:7783-77-9 99.99% 4N High Purity
C4F6 CAS:685-63-2 Hexafluoro-1 3-Butadiene 99.99% 4N chip Etching agent
C4F6 CAS:685-63-2 Hexafluoro-1 3-Butadiene 99.99% 4N chip Etching agent
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