Shandong Zhongshan Photoelectric Materials Co., Ltd
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(Total 12 Products for Semiconductor Materials C4f6 Cas 685 63 2)
Trifluoroiodomethane CAS：2314-97-8 99.99% 4N CF3I High Purity for Semiconductors erching processing materials Product use:
Chlorine Trifluoride CAS:7790-91-2 ClF3 High Purity 99.9% 3N Semiconductor Chemical gas
Chlorine Trifluoride CAS:7790-91-2 ClF3 High Purity 99.9% 3N Semiconductor Chemical gas Product introduction Chlorine trifluoride (ClF3) is a kind of corrosive, colorless, sweet-tasting gas with a molecular weight of 92.45, it turns green liquid when it is cooled, it is strong irritating and oxidizing even at low...
Tungsten hexafluoride CAS: 7783-82-6 WF6 High Purity 99.9% 3N Semiconductor material
Tungsten hexafluoride CAS: 7783-82-6 WF6 High Purity 99.9% 3N Semiconductor Material Product introduction Tungsten hexafluoride is a kind of colorless gas at room temperature, it is strong pungent, toxic and similar to toxicity of fluorine, its molecular formula is WF6
Hexafluoroethane CAS: 76-16-4 C2F6 Hight Purity 99.999% 5N For Semiconductor etchant gas
Hexafluoroethane CAS: 76-16-4 C2F6 Hight Purity 99.999% 5N For Semiconductor etchant gas
Nitrogen Trifluoride CAS: 7783-54-2 NF3 99.5%Plasma Etching Gas
Nitrogen Trifluoride CAS: 7783-54-2 NF3 99.5%Plasma Etching Gas
Perfluorobutadiene CAS:685-63-2 C4F6 99.99% 4N Hight Purity For Semiconductor
Perfluorobutadiene CAS:685-63-2 C4F6 99.99% 4N Hight Purity For Semiconductor
Carbonyl fluoride CAS: 353-50-4 COF2 99% Hight Purity For Water Etching Chemicals Agent
Carbonyl fluoride CAS: 353-50-4 COF2 99% Hight Purity For Water Etching Chemicals Agent
Sulfur Tetrafluoride CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate
Sulfur Tetrafluoride CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate
High Purity Hydrogen CAS:135-77-3 H2 99.999 5N High-purity Electronic Special Gas
High Purity Hydrogen CAS:135-77-3 H2 99.999% 5N High-purity Electronic Special Gas
Oxygen Difluoride CAS: 7783-41-7 OF2 Purity 99.5%For the Oxidation and Fluorination reaction.
Oxygen Difluoride CAS: 7783-41-7 OF2 Purity99.5%
Xenon Difluoride CAS: 13709-36-9 XeF2 99.999% 5N For Semiconductor Etching
Trifluoroiodomethane CAS : 2314-97-8 CF3I 99.99% Hight Purity For Water Etching Chemicals Agent
Trifluoroiodomethane CAS : 2314-97-8 CF3I 99.99% Hight Purity For Water Etching Chemicals Agent
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