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Shandong Zhongshan Photoelectric Materials Co., Ltd
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Product Categories
(Total 12 Products for H2 Hydrogen Semiconductor Process Material)
High Purity Hydrogen CAS:135-77-3 H2 99.999 5N High-purity Electronic Special Gas
High Purity Hydrogen CAS:135-77-3 H2 99.999% 5N High-purity Electronic Special Gas
High Purity Hydrogen Fluoride CAS:7664-39-3 HF Purity:99.999% 5N Semiconductor organic solution
High purity Hydrogen Fluoride CAS:7664-39-3 HF Purity:99.999% 5N Semiconductor
Hydrogen Fluoride CAS: 7664-39-3 HF 99.999% Hight Purity For Wafer Etching Materials
Hydrogen Fluoride CAS: 7664-39-3 HF 99.999% Hight Purity ForWafer Etching Materials
Trifluoroiodomethane CAS:2314-97-8 99.99% 4N CF3I High Purity for Semiconductors erching processing materials Product use:
Tungsten hexafluoride CAS: 7783-82-6 WF6 High Purity 99.9% 3N Semiconductor material
Tungsten hexafluoride CAS: 7783-82-6 WF6 High Purity 99.9% 3N Semiconductor Material Product introduction Tungsten hexafluoride is a kind of colorless gas at room temperature, it is strong pungent, toxic and similar to toxicity of fluorine, its molecular formula is WF6
High purity Silicon Tetrafluoride CAS: 7783-61-1 SiF4 99.999% 5N Chemical Electronic Specialty Gases
High purity Silicon Tetrafluoride CAS: 7783-61-1 SiF4 99.999% 5N Chemical Electronic Specialty Gases Product introduction Silicon tetrafluoride (SiF4) is a kind of colorless, toxic, pungent and smelly gas with a molecular weight of 104.06. Silicon tetrafluoride is easily deliquescent and can produce thick smoke in...
Hexafluoroethane CAS: 76-16-4 C2F6 Hight Purity 99.999% 5N For Semiconductor etchant gas
Hexafluoroethane CAS: 76-16-4 C2F6 Hight Purity 99.999% 5N For Semiconductor etchant gas
Perfluorobutadiene CAS:685-63-2 C4F6 99.99% 4N Hight Purity For Semiconductor
Perfluorobutadiene CAS:685-63-2 C4F6 99.99% 4N Hight Purity For Semiconductor
Carbonyl fluoride CAS: 353-50-4 COF2 99% Hight Purity For Water Etching Chemicals Agent
Carbonyl fluoride CAS: 353-50-4 COF2 99% Hight Purity For Water Etching Chemicals Agent
Sulfur Tetrafluoride CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate
Sulfur Tetrafluoride CAS: 7783-60-0 SF4 99% 2N For Plasma Etching and Medical Intermediate
Oxygen Difluoride CAS: 7783-41-7 OF2 Purity 99.5%For the Oxidation and Fluorination reaction.
Oxygen Difluoride CAS: 7783-41-7 OF2 Purity99.5%
Xenon Difluoride CAS: 13709-36-9 XeF2 99.999% 5N For Semiconductor Etching
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