Shandong Zhongshan Photoelectric Materials Co., Ltd
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Industrial gas is known as "the blood of industry". In the industry, according to different preparation methods and application fields, it can be divided into bulk gases and special gases. Special gas for electronics is an important branch of special gas, and it is an indispensable key raw material in the electronic industry production such as integrated circuit (IC), display panel (LCD, OLED), photovoltaic energy, optical fiber and cable. The performance of the device has an important impact.
Typical traditional fluorine-containing electron gases include CF4, C2F6, C3F8, C4F8, C4F6, CHF3, SF6, NF3, etc. The development of new, safe and environmentally friendly fluorine-containing electronic gases has become a hot spot for domestic and foreign research and industrialization in recent years.
In addition to environmental protection factors, advanced process technology also puts forward higher and higher requirements for etching gas: in advanced process, high aspect ratio process, unsaturated perfluoroolefins such as hexafluorobutadiene and octafluoroolefin are usually used. Fluorocyclopentene has better etching selectivity, accuracy and anisotropy.
There are mainly the following types of fluorine-containing electronic gases:
01Tetrafluoromethane (CF4)
Tetrafluoromethane is currently the largest plasma etching gas used in the microelectronics industry. It is widely used in the etching of materials such as silicon, silicon dioxide, silicon nitride and phosphosilicate glass, as well as in the surface cleaning of electronic devices, the production of solar cells, and laser technology. , Low-temperature refrigeration, gas insulation, leak detection agent, control of the attitude of space rockets, detergents, lubricants and brake fluids in the production of printed circuits are also used.
02Hexafluoroethane (C2F6)
Hexafluoroethane is used in the semiconductor and microelectronics industry as a plasma etching gas, device surface cleaning agent, and it can also be used in optical fiber production and low-temperature refrigeration. Because of its non-toxic, odorless and high stability, it is widely used in the semiconductor manufacturing process. With the rapid development of the semiconductor industry, the requirements for the purity of electronic special gases are getting higher and higher, and hexafluoroethane has the advantages of minimal edge erosion, high etching rate and high accuracy, and it is a very large-scale integrated circuit. The necessary medium plays an important role in the development of the semiconductor industry.
03Nitrogen Trifluoride (NF3)
Nitrogen trifluoride is mainly used in the cleaning of chemical vapor deposition (CVD) equipment in the semiconductor industry. Nitrogen trifluoride can be used alone or in combination with other gases as an etching gas for the plasma process.
04Sulfur hexafluoride (SF6)
Sulfur hexafluoride has excellent insulating properties and arc damping capabilities, and is widely used in power transmission and distribution and control equipment industries in power equipment. It is the third-generation insulating medium after the first-generation air and the second-generation oil.
05Tungsten hexafluoride (WF6)
Tungsten hexafluoride (WF6) is currently the only stable and industrialized product among tungsten fluorides. Its main use is in the electronics industry as a raw material for the chemical vapor deposition (CVD) process of tungsten metal, especially WSi2 made with it can be used as a wiring material in a large-scale integrated circuit (LSI).
06 Octafluoropropane (C3F8)
Octachloropropane is a perfluorinated compound with good stability. It is a colorless gas in the standard state and has a low degree of solubility in water and organic substances. In the semiconductor industry, a mixture of octafluoropropane and oxygen is used as a plasma etching material, which will selectively interact with the metal matrix of silicon wafers.
07 Octafluorocyclobutane (C4F8)
Octafluorocyclobutane has stable chemical properties, non-toxic and harmless, low greenhouse effect potential (GWP) value, and zero ozone depletion index (ODP) value. It is an environmentally friendly special gas. In recent years, it has been widely used as a refrigerant to replace prohibited chlorofluorocarbon compounds. In addition, it is also commonly used in gas insulating media, solvents, sprays, blowing agents, large-scale circuit etchants, heat pump working fluids, and the production of C2F4 and C3F6 monomers. Raw materials and so on.
08 Hexafluorobutadiene (perfluorobutadiene, C4F6)
Hexafluorobutadiene, also known as perfluorobutadiene, was originally synthesized as a polymer monomer. In recent years, the application research of hexafluorobutadiene has mainly focused on its use as an electronic etching gas.
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